Droplet-target laser-plasma source for proximity x-ray lithography

Lennart Malmqvist; L Rymell; H. M Hertz

doi:10.1063/1.116203

Droplet-target laser-plasma source for proximity x-ray lithography

Lennart Malmqvist, L Rymell, H. M Hertz

Atomfysik

Forskningsoutput: Tidskriftsbidrag › Artikel i vetenskaplig tidskrift › Peer review

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Sammanfattning

A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.

Originalspråk	engelska
Sidor (från-till)	2627-2629
Tidskrift	Applied Physics Letters
Volym	68
Nummer	19
DOI	https://doi.org/10.1063/1.116203
Status	Published - 1996

Ämnesklassifikation (UKÄ)

Atom- och molekylfysik och optik

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10.1063/1.116203

Malmqvist1996

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title = "Droplet-target laser-plasma source for proximity x-ray lithography",

abstract = "A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.",

author = "Lennart Malmqvist and L Rymell and Hertz, {H. M}",

year = "1996",

doi = "10.1063/1.116203",

language = "English",

volume = "68",

pages = "2627--2629",

journal = "Applied Physics Letters",

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T1 - Droplet-target laser-plasma source for proximity x-ray lithography

AU - Malmqvist, Lennart

AU - Rymell, L

AU - Hertz, H. M

PY - 1996

Y1 - 1996

N2 - A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.

AB - A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.

U2 - 10.1063/1.116203

DO - 10.1063/1.116203

M3 - Article

SN - 0003-6951

VL - 68

SP - 2627

EP - 2629

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 19

ER -

Droplet-target laser-plasma source for proximity x-ray lithography

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