First InGaAs lateral nanowire MOSFET RF noise measurements and model

Lars Ohlsson, Fredrik Lindelow, Cezar B. Zota, Matthias Ohlrogge, Thomas Merkle, Lars Erik Wernersson, Erik Lind

Forskningsoutput: Kapitel i bok/rapport/Conference proceedingKonferenspaper i proceedingPeer review

99 Nedladdningar (Pure)

Sammanfattning

The first radio frequency (RF) noise measurements on lateral nanowire metal-oxide-semiconductor field-effect transistors (MOSFETs) and a noise model are presented. We have characterized the RF noise and scattering parameters of an indium gallium arsenide (InGaAs) device. A fitted model yields extrapolated ft = 316 GHz current gain cutoff and fmax = 166 GHz maximum oscillation frequency. This device technology is being developed for millimeter wave circuit implementations, targeting a 94 GHz carrier frequency. The modeled intrinsic Fmin < 1dB minimum noise figure obtained promises performance at the target band, given reduction of gate parasitics. In any wireless system, noise and bandwidth limits the performance. Understanding of RF noise in nanowire MOSFET devices is thereby key for realization of future radar and communications systems.

Originalspråkengelska
Titel på värdpublikation75th Annual Device Research Conference, DRC 2017
FörlagIEEE - Institute of Electrical and Electronics Engineers Inc.
ISBN (elektroniskt)9781509063277
DOI
StatusPublished - 2017 aug. 1
Evenemang75th Annual Device Research Conference, DRC 2017 - South Bend, USA
Varaktighet: 2017 juni 252017 juni 28

Konferens

Konferens75th Annual Device Research Conference, DRC 2017
Land/TerritoriumUSA
OrtSouth Bend
Period2017/06/252017/06/28

Ämnesklassifikation (UKÄ)

  • Elektroteknik och elektronik

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