H2O adsorption on Ge(100): An angle-resolved photoelectron spectroscopy study

Christer Larsson, Anders Flodström

    Forskningsoutput: TidskriftsbidragLetterPeer review

    Sammanfattning

    The adsorption of H2O on Ge(100)2×1 was studied with angle-resolved photoelectron spectroscopy. The surface was exposed to H2O at 160 K. The sample was then heated to 300 K where the measurements were performed. The surface band structure was mapped in the [010] direction. We find six bands that we assign to a surface-adsorbate structure. One band with binding energy in the region 4.6–4.9 eV is assigned to the Ge-H bond. Another band dispersing between 5.6 and 5.8 eV is assigned to the Ge-OH bond. The results agree with models where the H2O is adsorbed dissociatively across the Ge-Ge dimers as H and OH on this surface at 300 K. Bands assigned to the H and OH groups disperse in momentum-energy space and we conclude that there is some long-range ordering within the adsorbate layer.
    Originalspråkengelska
    Sidor (från-till)9281-9283
    TidskriftPhysical Review B (Condensed Matter and Materials Physics)
    Volym43
    Nummer11
    DOI
    StatusPublished - 1991

    Ämnesklassifikation (UKÄ)

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