Molecularly selective nanopatterns using nanoimprint lithography: A label-free sensor architecture

Daniel Forchheimer, Gang Luo, Lei Ye, Lars Montelius

Forskningsoutput: Kapitel i bok/rapport/Conference proceedingKonferenspaper i proceedingPeer review

Sammanfattning

Nanoimprint lithography (NIL) can generate well defined nanostructures with high efficiency and at very low cost. Molecular imprinting (MIP) is a "bottom-up" technique creating a polymer layer exhibiting structures with a molecular selectivity. Such polymer structures may be employed as molecular recognition sites for sensing applications. In this work, the authors combine NIL with MIP and they are able to obtain micro- and nanopatterns of polymer with features down to 100 nm that show high molecular selectivity. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3527080]
Originalspråkengelska
Titel på värdpublikationJournal of Vacuum Science & Technology B
FörlagAmerican Vacuum Society
Volym29
DOI
StatusPublished - 2011
Evenemang54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication - Anchorage, AK
Varaktighet: 2010 juni 12010 juni 4

Publikationsserier

Namn
Nummer1
Volym29
ISSN (tryckt)1071-1023
ISSN (elektroniskt)1520-8567

Konferens

Konferens54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
Period2010/06/012010/06/04

Ämnesklassifikation (UKÄ)

  • Biokemi och molekylärbiologi
  • Den kondenserade materiens fysik

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