Negative UV–NIL (NUV–NIL) – A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures

Lars Henrik Skjolding, Genis Turon Teixidor, Jenny Emnéus, Lars Montelius

Forskningsoutput: Kapitel i bok/rapport/Conference proceedingKonferenspaper i proceedingPeer review

13 Citeringar (SciVal)

Sammanfattning

This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.
Originalspråkengelska
Titel på värdpublikationMicroelectronic Engineering
FörlagElsevier
Sidor654-656
Volym86
DOI
StatusPublished - 2009
Evenemang34th International Conference on Micro- and Nano-Engineering - Athens, Grekland
Varaktighet: 2008 sep. 152008 sep. 18

Publikationsserier

Namn
Nummer4-6
Volym86
ISSN (tryckt)1873-5568
ISSN (elektroniskt)0167-9317

Konferens

Konferens34th International Conference on Micro- and Nano-Engineering
Land/TerritoriumGrekland
OrtAthens
Period2008/09/152008/09/18

Bibliografisk information

The information about affiliations in this record was updated in December 2015.
The record was previously connected to the following departments: Solid State Physics (011013006), Analytical Chemistry (S/LTH) (011001004)

Ämnesklassifikation (UKÄ)

  • Den kondenserade materiens fysik

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