This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.
|Titel på värdpublikation||Microelectronic Engineering|
|Status||Published - 2009|
|Evenemang||34th International Conference on Micro- and Nano-Engineering - Athens, Grekland|
Varaktighet: 2008 sep. 15 → 2008 sep. 18
|Konferens||34th International Conference on Micro- and Nano-Engineering|
|Period||2008/09/15 → 2008/09/18|
Bibliografisk informationThe information about affiliations in this record was updated in December 2015.
The record was previously connected to the following departments: Solid State Physics (011013006), Analytical Chemistry (S/LTH) (011001004)
- Den kondenserade materiens fysik