Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)

Rosemary Jones, Giulio D’Acunto, Payam Shayesteh, Indiana Pinsard, François Rochet, Fabrice Bournel, Jean Jacques Gallet, Ashley Head, Joachim Schnadt

Forskningsoutput: TidskriftsbidragArtikel i vetenskaplig tidskriftPeer review


The introduction of atomic layer deposition (ALD), to the microelectronics industry has introduced a large number of new possible materials able to be deposited in layers with atomic thickness control. One such material is the high-κ oxide HfO2; thermally stable and ultrathin HfO2 films deposited by ALD are a significant contender to replace SiO2 as the gate oxide in capacitor applications. We present a mechanistic study of the first deposition cycle of HfO2 on the Si(111) surface using tetrakis(dimethylamido) hafnium (TDMAHf) and water as precursors using operando ambient pressure x-ray photoelectron spectroscopy. Here, we show that the hydroxylation of the clean Si(111) surface by residual water vapor, resulting in a 0.3 monolayer coverage of hydroxyls, leads to instantaneous full surface coverage of TDMAHf. The change in the atomic ratio of Hf to C/N found during the first deposition half-cycle, however, does not match the assumed immediate ligand loss through reaction with surface hydroxyls. One would expect an immediate loss of ligands, indicated by a Hf:N ratio of approximately 1:3 as TDMAHf deposits onto the surface; however, a Hf:N ratio of 1:3.6 is observed. The partial hydroxylation on the Si(111) surface leads to binding through the TDMAHf ligand N atoms resulting in both N and CH3 being found remaining on the surface post water half-cycle. Although there is evidence of ligand exchange reactions occurring at Si-OH sites, it also seems that N binding can occur on bare Si, highlighting the complexity of the substrate/precursor reaction even when hydroxyls are present. Moreover, the initial low coverage of Si-OH/Si-H appears to severely limit the amount of Hf deposited, which we hypothesize is due to the specific geometry of the initial arrangement of Si-OH/Si-H on the rest- and adatoms.

TidskriftJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
StatusPublished - 2024 mars 1

Ämnesklassifikation (UKÄ)

  • Den kondenserade materiens fysik


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