Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography

M Keil, Marc Beck, G Frennesson, Elke Theander, E Bolmsjö, Lars Montelius, B Heidari

Forskningsoutput: Kapitel i bok/rapport/Conference proceedingKonferenspaper i proceedingPeer review

Originalspråkengelska
Titel på värdpublikationJ Vac Sci Technol B 22, 3283-3287 (2004)
StatusPublished - 2004
Evenemang48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004) -
Varaktighet: 0001 jan. 2 → …

Konferens

Konferens48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004)
Period0001/01/02 → …

Ämnesklassifikation (UKÄ)

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