Quantitative characterization of aberrations in x-ray optics

Frank Seiboth, Maik Kahnt, Maria Scholz, Martin Seyrich, Felix Wittwer, Jan Garrevoet, Gerald Falkenberg, Andreas Schropp, Christian G. Schroer

Forskningsoutput: Kapitel i bok/rapport/Conference proceedingKonferenspaper i proceedingPeer review

11 Citeringar (SciVal)

Sammanfattning

Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.

Originalspråkengelska
Titel på värdpublikationAdvances in X-Ray/EUV Optics and Components XI
RedaktörerChristian Morawe, Ali M. Khounsary, Shunji Goto
FörlagSPIE
Volym9963
ISBN (elektroniskt)9781510603172
DOI
StatusPublished - 2016 jan. 1
Externt publiceradJa
EvenemangConferene on Advances in X-Ray/EUV Optics and Components XI - San Diego, USA
Varaktighet: 2016 aug. 312016 sep. 1

Konferens

KonferensConferene on Advances in X-Ray/EUV Optics and Components XI
Land/TerritoriumUSA
OrtSan Diego
Period2016/08/312016/09/01

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