Random telegraph signal noise in tunneling field-effect transistors with S below 60 mV/decade

Markus Hellenbrand, Elvedin Memisevic, Johannes Svensson, Erik Lind, Lars-Erik Wernersson

Forskningsoutput: Kapitel i bok/rapport/Conference proceedingKonferenspaper i proceeding

163 Nedladdningar (Pure)

Sammanfattning

Single gate oxide defects in strongly scaled Tunneling Field-Effect Transistors with an inverse subthreshold slope well below 60 mV/decade are investigated by Random Telegraph Signal (RTS) noise measurements. The cause for RTS noise are electrons being captured in and released from individual defects in the gate oxide. Under the assumption that elastic tunneling is the underlying capture and emission mechanism, the measured RTS time constants vary with the relative position of the channel Fermi level and the defect energy level while the amplitudes — independent of the capture and release mechanism — follow the inverse of the inverse subthreshold slope.
Originalspråkengelska
Titel på värdpublikation47th European Solid-State Device Research Conference (ESSDERC), 2017
FörlagIEEE - Institute of Electrical and Electronics Engineers Inc.
Sidor38-41
Antal sidor4
ISBN (elektroniskt)978-1-5090-5978-2
ISBN (tryckt)978-1-5090-5979-9
DOI
StatusPublished - 2017 sep.
EvenemangESSDERC 47th European Solid-State Device Research Conference - Leuven, Belgien
Varaktighet: 2017 sep. 112017 sep. 14

Annan

AnnanESSDERC 47th European Solid-State Device Research Conference
Land/TerritoriumBelgien
OrtLeuven
Period2017/09/112017/09/14

Ämnesklassifikation (UKÄ)

  • Nanoteknik

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