Resonators with integrated CMOS circuitry for mass sensing applications, fabricated by electron beam lithography

Sara Ghatnekar-Nilsson, E Forsen, G Abadal, J Verd, F Campabadal, F Perez-Murano, J Esteve, N Barniol, A Boisen, Lars Montelius

Forskningsoutput: TidskriftsbidragArtikel i vetenskaplig tidskriftPeer review

36 Citeringar (SciVal)

Sammanfattning

A resonator system has been fabricated directly on a pre-processed CMOS chip. The system is to be used for high sensitivity mass sensing applications in air and vacuum. The resonator system, corresponding of a cantilever and structures for electrostatic actuation and capacitive read-out, have been defined by electron beam lithography on top of a charge and radiation sensitive CMOS layer in predefined areas as a post-process step. This has been accomplished without affecting the electronic properties of the pre-processed CMOS circuits. The subsequent etching steps to fully release the cantilevers have been obtained without stiction of the cantilevers to the substrate. Cantilevers are driven at their mechanical resonance in a lateral mode, and the frequency is monitored by capacitive read-out on the chip. CMOS integration enables signal detection directly on the chip, which radically decreases the parasitic capacitances. Consequently, low-noise electrical measurements with a very high mass sensitivity are obtained. Fabricated resonator systems were characterized to have resonance frequencies of approximately 1.49 MHz, which is in good agreement with a theoretical estimation of 1.41 MHz. The theoretical mass resolution, partial derivativem/partial derivativef, is approximately 17 ag Hz(-1) using a Young modulus value of 160 GPa.
Originalspråkengelska
Sidor (från-till)98-102
TidskriftNanotechnology
Volym16
Utgåva1
DOI
StatusPublished - 2005

Ämnesklassifikation (UKÄ)

  • Nanoteknik

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