Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer

Anette Löfstrand, Reza Jafari Jam, Muhammad Mumtaz, Karolina Mothander, Tommy Nylander, Alexei Vorobiev, Ahibur Rahaman, Wen Chang Chen, Redouane Borsali, Ivan Maximov

Forskningsoutput: Kapitel i bok/rapport/Conference proceedingKonferenspaper i proceedingPeer review

Sammanfattning

This study presents how sequential infiltration synthesis of trimethyl aluminium and water into a carbohydrate-based block copolymer was used to enable pattern transfer of 6 nm half-pitch horizontal cylinders into silicon. Specular neutron reflectometry measurements of poly(styrene)-block-maltoheptaose self-assembled into horizontal cylinders indicate an increasing content of alumina after each sequential infiltration cycle, comparing 0, 1, 2, and 4 cycles, with alumina content reaching 2.4 vol% after four infiltrations cycles. Dry etching processes in inductively coupled plasma reactive ion etching for sub-10 nm patterns were developed, using a two-step technique: O2-plasma for polymer removal and a reactive ion etching of Si using a mixture of SF6 and C4F8 gases. Etch selectivity of more than 2:1 of silicon over alumina-like etch mask material was achieved. To evaluate the etching process, the etched Si structures were measured and characterized by scanning electron microscopy. These results are expected to be of use for nanofabrication and applications in the sub-10 nm regime.

Originalspråkengelska
Titel på värdpublikationAdvances in Patterning Materials and Processes XXXVIII
RedaktörerDaniel P. Sanders, Douglas Guerrero
FörlagSPIE
ISBN (elektroniskt)9781510640573
DOI
StatusPublished - 2021
EvenemangAdvances in Patterning Materials and Processes XXXVIII 2020 - Virtual, Online, USA
Varaktighet: 2021 feb. 222021 feb. 26

Publikationsserier

NamnProceedings of SPIE - The International Society for Optical Engineering
Volym11612
ISSN (tryckt)0277-786X
ISSN (elektroniskt)1996-756X

Konferens

KonferensAdvances in Patterning Materials and Processes XXXVIII 2020
Land/TerritoriumUSA
OrtVirtual, Online
Period2021/02/222021/02/26

Ämnesklassifikation (UKÄ)

  • Nanoteknik
  • Den kondenserade materiens fysik
  • Annan fysik

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