@inproceedings{7d04fcd1ddcd4f608bdc09518744e2c6,
title = "Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer",
abstract = "This study presents how sequential infiltration synthesis of trimethyl aluminium and water into a carbohydrate-based block copolymer was used to enable pattern transfer of 6 nm half-pitch horizontal cylinders into silicon. Specular neutron reflectometry measurements of poly(styrene)-block-maltoheptaose self-assembled into horizontal cylinders indicate an increasing content of alumina after each sequential infiltration cycle, comparing 0, 1, 2, and 4 cycles, with alumina content reaching 2.4 vol% after four infiltrations cycles. Dry etching processes in inductively coupled plasma reactive ion etching for sub-10 nm patterns were developed, using a two-step technique: O2-plasma for polymer removal and a reactive ion etching of Si using a mixture of SF6 and C4F8 gases. Etch selectivity of more than 2:1 of silicon over alumina-like etch mask material was achieved. To evaluate the etching process, the etched Si structures were measured and characterized by scanning electron microscopy. These results are expected to be of use for nanofabrication and applications in the sub-10 nm regime.",
keywords = "Block copolymer, Carbohydrate, Pattern transfer, Sequential infiltration synthesis, Specular neutron reflectometry",
author = "Anette L{\"o}fstrand and {Jafari Jam}, Reza and Muhammad Mumtaz and Karolina Mothander and Tommy Nylander and Alexei Vorobiev and Ahibur Rahaman and Chen, {Wen Chang} and Redouane Borsali and Ivan Maximov",
year = "2021",
doi = "10.1117/12.2583803",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Sanders, {Daniel P.} and Douglas Guerrero",
booktitle = "Advances in Patterning Materials and Processes XXXVIII",
address = "United States",
note = "Advances in Patterning Materials and Processes XXXVIII 2020 ; Conference date: 22-02-2021 Through 26-02-2021",
}